WITec GmbH, Ulm, Germany

Alpha300RA AFM & RAMAN

UHTS 300, Ultrahigh throughput lens based spectrograph with 300 mm focal length.

Andor Back illuminated CCD camera with >90% QE in the visible region. The CCD chip is a 1024 x 127 pixels with the pixel size of 24 microns

The instrument is a WITec alpha300RA (WITec GmbH, Ulm, Germany) AFM, SNOM &RAMANcombined system. The laser is coupled into the microscope using a single mode optical fiber coupling and the RAMAN signal is collected into a multimode optical fiber which is connected to the UHTS 300 spectrograph equipped with a back illuminated CCD with better than 90% QE in the visible region.

532 nm DPSS laser with a maximum power after single mode fiber of around 70 mW.

UHTS 300 is equipped with a motorized turret that can mount 3 gratings. The gratings available with the instrument are 600 g/mm BLZ 550 nm & 1800 g/mm BLZ 550 nm.

Modified Zeiss Axioscope.

100X Zeiss 0.9 NA, 50X Zeiss 0.75 NA, 20X Zeiss 0.4 NA, 10X Zeiss 0.25 NA

Fluorolog 3 TCSPC

295,330,570nm-NanoLed 355,395nm-SpectralLed

FL3-21, Single-grating emission and double-grating excitation monochromator.

1200-grooves/mm

0.2 nm

±0.5 nm

150nm/s

0-1300nm

RT298P (PMT)

< 100 ps to 100 microsecond lifetimes

8045

ESI and APCI

Q1 Scan/SIM
Q3 Scan/SIM
Precursor ion Scan
Product ion scan
Neutral loss scan

Secondary Electron Multiplier with off-axis conversion dynode

MAIA3 XMH

MAIA3 – an exceedingly powerful tool for comprehensive nano materials characterization, gentle observation of beam-sensitive samples and comfortable imaging of non-conductive samples including uncoated biological specimens and semiconductors. The finest sub-nanometer details of even low-contrast samples are captured using the Triglav™ SEM column along with the ultra-high resolution Trilens™ optics and an impeccable detection system with triple SE and triple BSE detectors. Userfriendliness is enhanced by a large number of sophisticated SW modules and automatic procedures. MAIA 3 model was designed to perform an imaging with low-energy electrons and an ultra-high resolution at the same time. The low energy electrons give better material contrast, prevent specimens from possible damage and non- conductive specimens from charging. It is having XMH microscope which is working only in high vacuum conditions. In high vacuum mode it is possible to investigate both conductive and non-conductive samples ( non-conductive samples require previous metal (sputtered) or carbon coating.)

Electron Gun: High brightness Schottky emitter Resolution: 0.7 nm at 15 kV 1.0 nm at 1 kV (with BDM Mode) Magnification: 4x to 1,000,000x Maximum Field of View: 4.3 mm at WD analytical 5 mm 7.5 mm at WD 30 mm Accelerating Voltage: 200 V to 30 kV/ / down to 50 eV with BDT Probe Current: 2 pA to 400 Na Specimen Stage: Compucentric, fully motorized Movements Electron Optics Working Modes: Resolution: Ultra-high resolution mode Depth: Sets the column up in a mode that enhances depth of focus Field: Optimizes the column to provide a large non-distorted field of view, field-free mode suitable for magnetic samples

SE Detector
* In-Beam SE Detector
* BSE Detector
* In-Beam BSE Detector